Methane sensing studies of ex-situ oxidized sputtered V2O5 nanostructured films: Effect of post oxidation duration

Authors

  • Gomathi Natarajan Indira Gandhi Centre for Atomic Research, Kalpakkam
  • Reshma P. R Indira Gandhi Centre for Atomic Research, Kalpakkam
  • Ashok Bahuguna Indira Gandhi Centre for Atomic Research, Kalpakkam
  • Ramanathaswamy Pandian Indira Gandhi Centre for Atomic Research, Kalpakkam
  • Arun K Prasad Indira Gandhi Centre for Atomic Research, Kalpakkam

Keywords:

Vanadium Pentoxide, RF sputtering, microstructure tailoring, oxidation time, methane sensing

Abstract

The effect of microstructural modifications of V2O5 thin films, obtained through alterations in post oxidation duration, on methane sensing behavior is reported for the first time. Three different oxidation times viz., 1 h, 3 h and 5 h yielded varied microstructure and vibrational properties as evident from XRD and Raman investigation. These changes in properties manifest as differences in gas sensing behavior. Methane sensing properties of V2O5 was investigated in temperature range from 100 to 300 °C and optimum operating temperature of 200 °C was identified for all three samples. Films oxidized for 1 h showed the highest response due to favorable surface conditions which are discussed. These results will help in tailoring microstructure towards device level application processes. 

Author Biography

  • Gomathi Natarajan, Indira Gandhi Centre for Atomic Research, Kalpakkam

    Surface Science Section, Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102, Tamil Nadu, India

methane sensing with V2O5

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Published

2022-02-08

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Section

Articles

How to Cite

Methane sensing studies of ex-situ oxidized sputtered V2O5 nanostructured films: Effect of post oxidation duration . (2022). Journal of Materials NanoScience, 9(1), 26-30. https://pubs.thesciencein.org/journal/index.php/jmns/article/view/304

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